Lawrence Livermore National Laboratory (LLNL) is pushing the boundaries of EUV lithography with its Big Aperture Thulium (BAT) laser. This project aims to increase EUV source efficiency by 10 times, paving the way for a 'beyond EUV' (BEUV) lithography system.
LLNL has long pioneered the development of EUV lithography, including early spectroscopic studies that formed the foundation of plasma-based EUV sources. A California-based laboratory is set to lay the groundwork for the next evolution of extreme ultraviolet (EUV) lithography. Led by Lawrence Livermore National Laboratory (LLNL), the project aims for the next evolution of EUV lithography, centered around the lab-developed driver system named the Big Aperture Thulium (BAT) laser.
The LLNL-led project will test the BAT laser’s ability to increase EUV source efficiency by about 10 times when compared to carbon dioxide (CO2) lasers, the current industry standard, according to the lab. LLNL maintains that this could lead to a next-generation “beyond EUV” (BEUV) lithography system producing chips that are smaller, more powerful, and faster to manufacture while using less electricity. “Our work has already had quite an impact in the EUV lithography community, so now we’re excited to take this next step,” added Reagan. The BAT laser works by firing at tens of thousands of droplets of tin per second. The laser heats the droplets, each measuring about 30 millionths of a meter, to half a million degrees centigrade to produce a plasma that generates ultraviolet light with a wavelength of 13.5 nanometers. This ultraviolet light is used to create patterns on semiconductor wafers
EUV Lithography BEUV BAT Laser Semiconductor Manufacturing Lawrence Livermore National Laboratory
United States Latest News, United States Headlines
Similar News:You can also read news stories similar to this one that we have collected from other news sources.
Ford Puma Gen-E: Mustang Mach-E’s Little Brother With Up To 233 Miles Of RangeThe electric crossover is smaller than the discontinued first-generation Chevrolet Bolt EUV.
Read more »
Drive-thru turkey drive in San Francisco collects holiday meals families in needA drive-thru turkey donation drive was held in San Francisco on Saturday, benefitting the San Francisco-Marin Food Bank. It brought a big donation response from the community, coming at a time when the need for food has never been greater.
Read more »
ASML Cancels Lego High-NA EUV SaleASML, the sole manufacturer of EUV lithography machines, intended to sell a Lego version of its High-NA EUV machine for $230. However, the set was intended exclusively for ASML employees, leading to the cancellation of orders from external buyers.
Read more »
ASML Cancels High-NA EUV Lego Set SalesASML, the sole manufacturer of Extreme Ultraviolet Lithography (EUV) machines, intended to sell a Lego replica of their High-NA EUV machine. However, the company has cancelled the sales due to the set being intended for ASML employees only.
Read more »
ASML's EUV Technology Creates a 10-15 Year Gap for Chinese ChipmakersThe lack of access to ASML's EUV lithography machines due to export restrictions is hindering China's progress in producing cutting-edge chips, putting them 10 to 15 years behind Western counterparts.
Read more »
ASML EUV Dominance: China's Chip Manufacturing LagASML's exclusive production of EUV Lithography machines underscores China's struggle to achieve cutting-edge chip manufacturing capabilities.
Read more »